Studies and Research on the Production of TiO2 and TiN thin Film by Assisted Physical Vapor Deposition Magnetron Process

Abstract

The experimental research carried out in this paper aims at obtaining thin films of TiO2 and TiN and at characterizing them in terms of morphology, structure, transparency and electrical properties. The films were obtained using a PVD device of sputtering coating, consisting of a vacuum chamber with a capacity of 2 liters, a planar magnetron with ferrite magnets.